[반도체공정] EUV Lithography Term paper (영문작성)

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"[반도체공정] EUV Lithography Term paper (영문작성)"에 대한 내용입니다.

목차

1. Introduction
2. Necessity of EUV Lithography
3. Characteristics of EUV Lithography
4. Technology for EUV Lithography
5. Contamination Management
6. Conclusion

References

본문내용

In February 2018, ground-breaking ceremony for EUV line was held at Samsung Electronics’ campus in Hwaseong, which is under construction as illustrated in Figure 1. EUV line is the newest technology which makes state-of-the-art semiconductors for mobile devices. The initial cost for the line is expected to be 6 billion dollars before when it is operated. Using EUV line, Samsung Electronics is looking forward to being a leader in nanometer semiconductor era.
Recently, Samsung Electronics announced that it has just succeeded in developing a 5nm foundry process based on EUV technology. The company is now also doing mass-production by 6nm and 7nm foundry process. Early in 2019, Samsung Electronics have accelerated mass-production for 7nm products based on EUV, and it is the first time in the industry.
This way, the term ‘EUV’ is frequently used in articles about next generation semiconductor processes. Then this paper will introduce what it is and how it play a role in semiconductor chip production.

참고 자료

Vivek Bakshi, EUV Lithography, SPIE Press, 2009
Zheng Cui, Nanofabrication : principles, capabilities and limits, Springer, 2008
Michael Herh, Samsung Electronics Develops EUV-based 5-nm Lithography Process, BUSINESS KOREA, 2019
T.J. Chung and J.J. You, Recent Trends of Lithographic Technology, Electronics and Telecommunications Trends , Vol. 13(5), 1998
Prof. Jang-Sik Lee, Semiconductor Processing, Department of Materials Science & Engineering, POSTECH, 2019
Lawrence Livermore National Laboratory, Extreme Ultraviolet Lithography Imaging the Future, EUVL Progress Report, S&TR November 1999
Matt Smith, Extreme Ultra-Violet Lithography, Penn State University, 2006
Bo Cui, Extreme UV (EUV) lithography, Fabrication in the nanoscale : principles, technology and applications, University of Waterloo
Korea Institute of Science and Technology Information(KiSTi) MCT NET, EUV Lithography for nanoscale semiconductor
Min Hyeok Yun, 삼성전자∙TSMC가 목매는 ‘수퍼乙’... EUV 독점하는 ASML, Chosun Biz, 2019
Solid State Technology, Ushio hands Gigaphoton EUV JV to Komatsu, 2011
David Lammers, Race Intensifies to Develop EUV Source, EUV Newsletter, 2011
Ghansyam B. Rathod, et al. Review on Extreme Ultraviolet Lithography, Volume 4, Issue 2, IJARCSEE 2014
Yuan Taur, Fundamentals of Modern VLSI Devices, 2nd edition, Cambridge University Press, 2009
Ampere A. Tseng, Nanofabrication : Fundamentals and Applications, World Scientific, 2008